Work

Aligning Method using Concentric $Moir\'{e}$ in Nanoimprint Lithography

Year: 2006

Type: article

Abstract: Nanoimprint lithography is an emerging technology which has an ability to make patterns under 100nm width. Recently many researches have been focused to develop multilayer patterning function in nanoimprint lithography and aligning method is attracting attention as a key technology. has been used widely to measure dislocation or deformation of objects and considered one of the best solutions to detect aligning error in nanoimprint lithography. Concentric circular patterns are used to generate a fringe in this paper and aligning offset and direction are extracted from it. Especially this paper shows the difference of fringe equation of which can be obtained in nanoimprint process atmosphere from normal one.

Source: Journal of the Korean Society for Precision Engineering

Authors: 김기홍, 이재종, 최기봉, 박수연, 조현택, 이종현

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W34387236

FWCI:

Cites: 16

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Related to: 10