Work

Machine learning approach to thickness prediction fromin situspectroscopic ellipsometry data for atomic layer deposition processes

Year: 2021

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0001482

Authors: Ayush Arunachalam, S. Novia Berriel, Corbin Feit, Udit Kumar, Sudipta Seal, Kanad Basu, Parag Banerjee

Institutions: University of Central Florida, The University of Texas at Dallas

Language: English

Topic: Optical Polarization and Ellipsometry

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Semiconductor Research Corporation, Directorate for Engineering

Awards: G4924688824, G7516802717

OpenAlex ID: W4200394052

FWCI: 0.684

Cites: 34

Cited by: 22

Related to: 10