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Patterning hot spot verification using high speed e-beam metrospection with D2DB at foundry high volume manufacturing environment

Year: 2021

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1109/iwaps54037.2021.9671249

Institution: Shanghai Huali Microelectronics (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4206625090

FWCI:

Cites: 10

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Related to: 10