Work

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Year: 2022

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.21.2.024401

Authors: Dongbo Xu, Werner Gillijns, Ling Ee Tan, Vicky Philipsen, Ryoung-Han Kim

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4226115525

FWCI: 0.273

Cites:

Cited by: 5

Related to: 10