Work

Spray CVD of Copper Indium Sulfide Films: Control of Microstructure and Crystallographic Orientation

Year: 1999

Type: article

Source: Chemical Vapor Deposition

DOI: 10.1002/(sici)1521-3862(199906)5:3<105::aid-cvde105>3.0.co;2-g

Authors: Jennifer A. Hollingsworth, Aloysius F. Hepp, William E. Buhro

Institutions: Washington University in St. Louis, Glenn Research Center

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2951817012

FWCI: 7.988

Cites:

Cited by: 66

Related to: 10