Work

Massively Parallel Dip–Pen Nanolithography with 55 000‐Pen Two‐Dimensional Arrays

Year: 2006

Type: article

Source: Angewandte Chemie

DOI: 10.1002/ange.200603142

Authors: Khalid Salaita, Yuhuang Wang, Joseph Fragala, Rafael A. Vega, Chang Liu, Chad A. Mirkin

Institutions: Northwestern University, International Institute for Nanotechnology, University of Illinois Urbana-Champaign

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4233440742

FWCI: 4.634

Cites: 18

Cited by: 66

Related to: 10