(Invited) Nano-Precision Deep Reactive Ion Etching of Monocrystalline 4H-SiCOI for Bulk Acoustic Wave Resonators with Ultra-Low Dissipation
Year: 2020
Type: conference-abstract
Source: ECS Meeting Abstracts
Authors: Farrokh Ayazi, Benoit Hamelin, Jeremy Yang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4233618910
