Work

Semiconductor Lithography: Principles, Practices, and Materials

Year: 1988

Type: book

Source: Springer eBooks

DOI: 10.1007/978-1-4613-0885-0

Author: Wayne M. Moreau

Institution: IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4236566899

FWCI: 6.918

Cites: 3

Cited by: 590

Related to: 10

Parts: 17