Work

Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Year: 1999

Type: article

Source: Advanced Materials

DOI: 10.1002/(sici)1521-4095(199903)11:4<314::aid-adma314>3.0.co;2-e

Authors: David C. Tully, Kathryn Wilder, Jean M. J. Fréchet, Alexander R. Trimble, Calvin F. Quate

Institutions: University of California, Berkeley, Stanford University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2047925660

FWCI: 10.34

Cites:

Cited by: 95

Related to: 10