A compact and low loss Y-junction for submicron silicon waveguide
Year: 2013
Type: article
Abstract: We designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 ± 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 μm x 2 μm, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers.
Source: Optics Express
DOI: 10.1364/oe.21.001310
Authors: Yi Zhang, Shuyu Yang, Andy Eu-Jin Lim, Guo-Qiang Lo, Christophe Galland, Tom Baehr-Jones, Michael Hochberg
Institution: University of Delaware
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,270
OpenAlex ID: W4240590154