Closure to “Discussion of ‘A Quantitative Model for the Diffusion of Phosphorus in Silicon and the Emitter Dip Effect’ [R. B. Fair and J. C. C. Tsai pp. 1107–1118, Vol. 124, No. 7]”
Year: 1978
Type: article
DOI: 10.1149/1.2131609
Authors: R. B. Fair, J. C. C. Tsai
Institution: AT&T (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W4249196804
