Junction Formation in Silicon by Rapid Thermal Annealing
Year: 1993
Type: article
Source: MRS Proceedings
DOI: 10.1557/proc-303-311
Author: Richard B. Fair
Institutions: Duke University, MCNC Research and Development Institute
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4250902545