Natural lithography
Year: 1982
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.93501
Authors: H. W. Deckman, J. H. Dunsmuir
Institution: ExxonMobil (United States)
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4252568416