Work

Plasma-enhanced chemical vapour deposition of fluorinated silicon dioxide films using novel alkylsilanes

Year: 1996

Type: article

Source: Advanced Materials for Optics and Electronics

DOI: 10.1002/(sici)1099-0712(199603)6:2<93::aid-amo231>3.0.co;2-z

Authors: Ravi K. Laxman, Arthur K. Hochberg, David A. Roberts, Raymond N. Vrtis, Saul Ovalle

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2020140420

FWCI: 0.289

Cites:

Cited by: 6

Related to: 10