Work

Etch proximity correction for dense array patterns

Year: 2022

Type: conference-paper

DOI: 10.1117/12.2610743

Authors: Jian Wang, Sainan Yao, Yingchun Zhang

Institution: Semiconductor Manufacturing International (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4281554944

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