Work

Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography (Erratum)

Year: 2022

Type: erratum

Abstract: The erratum corrects an error in the parameter units in the original article.

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.21.3.039801

Author: Hiroshi Fukuda

Institutions: Hitachi High-Tech (Japan), Hitachi (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4286254538

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