Work

Atomic Precision Advanced Manufacturing and Lessons for Area-Selective Deposition.

Year: 2021

Type: conference-paper

Abstract: Optimized for atom-scale imaging and patterningClean and H-terminated Si(100) 2×1 Sub-atmospheric (mTorr

DOI: 10.2172/1877517

Authors: Scott Schmucker, Esther Frederick, Quinn Campbell, Jeffrey Ivie, Evan Anderson, Kevin Dwyer, Andrew Baczewski, George Wang, Robert Butera, Shashank Misra

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Funders: U.S. Department of Energy, National Nuclear Security Administration, Sandia National Laboratories

Awards: G11630931, G2214935549, G413247060, G4903105778, G5339743583, G855168022

OpenAlex ID: W4288075757

FWCI:

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