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12-inch 90-nm BCD Process Optimization: Reducing Wafer Edge LDMOS Leakage

Year: 2022

Type: conference-paper

Source: China Semiconductor Technology International Conference (CSTIC)

DOI: 10.1109/cstic55103.2022.9856762

Authors: Hualun Chen, Li Wang, Li Xiao, Yong Chen, Tian Chen, Guangyuan Lu, Jian Wang, Fan Ji

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4292829416

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Cites: 3

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Related to: 10