Achieving zero EUV patterning defect with dry photoresist system
Year: 2022
Type: conference-paper
DOI: 10.1117/12.2623499
Authors: Mohammed Alvi, Richard Gottscho, Ali Haider, Seongjun Heo, PingYen Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, Da Li, Henry Nguyen, Yang Pan, Daniel Peter, Nader Shamma, Anuja De Silva, Samantha Tan, Ethen Wang, Timothy Weidman, Rich Wise, Morrey Wu, Elisseos Verveniotis, Boris Volosskiy, Jengyi Yu, Hicham Zaid
Institution: Lam Research (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4294955614