Method to produce ultra-low friction carbon films
Year: 2001
Type: article
Abstract: A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO2, can be formed from SiH4 with or without oxidation of the layer formed.
DOI: 10.6082/vre7t-qnk93
Authors: Erdemir, Ali, Fenske, George R., Eryilmaz, Osman Levent, Lee, Richard H.
Institution: Argonne National Laboratory
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W4300530957