Work

Spatial frequency breakdown of CD variation

Year: 2022

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.2640808

Authors: Tatiana Kovalevich, Barbara Witek, Daniel Riggs, Joost Bekaert, Lieve Van Look, Mark John Maslow

Institutions: IMEC, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4307817642

FWCI:

Cites: 3

Cited by:

Related to: 10