Work

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Year: 2022

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.2641647

Authors: Dan N. Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil M. Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Institutions: The University of Texas at Dallas, Inha University, Stony Brook University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4308702036

FWCI: 2.746

Cites: 16

Cited by: 11

Related to: 10