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Damage-free pinpoint particle removal for EUV pellicle cleaning

Year: 2022

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.2641583

Authors: Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4309138765

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