Work

Advanced Lithography

Year: 2022

Type: book-chapter

Source: Springer handbooks

DOI: 10.1007/978-3-030-79827-7_8

Author: Alberto Roncaglia

Institutions: National Research Council, Institute for Microelectronics and Microsystems

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4309444616

FWCI: 3.285

Cites: 41

Cited by: 4

Related to: 10