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Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography

Year: 2022

Type: article

Abstract: Special section editors Anuja De Silva and Yasin Ekinci introduce the Special Section on Non-chemically Amplified Resists for EUV Lithography.

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.21.4.041401

Authors: Anuja De Silva, Yasin Ekinci

Institution: Paul Scherrer Institute

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4312134933

FWCI:

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