Work

Complementary FET (CFET) Standard Cell Design for Low Parasitics and Its Impact on VLSI Prediction at 3-nm Process

Year: 2022

Type: article

Source: IEEE Transactions on Very Large Scale Integration (VLSI) Systems

DOI: 10.1109/tvlsi.2022.3220339

Authors: Eunbin Park, Taigon Song

Institutions: Pohang University of Science and Technology, Kyungpook National University

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Science, ICT and Future Planning, National Research Foundation of Korea, IC Design Education Center, Samsung

Award: G8226453395

OpenAlex ID: W4312992159

FWCI: 2.521

Cites: 36

Cited by: 52

Related to: 10