Work

High-performance oxide thin-film diode and its conduction mechanism based on ALD-assisted interface engineering

Year: 2022

Type: article

Source: Journal of Materials Chemistry C

DOI: 10.1039/d2tc03751c

Authors: Hye-In Yeom, Jingyu Kim, Guk-Jin Jeon, Jeongwoo Park, Dong Uk Han, Joohyeong Kim, Kyung Min Kim, Bonggeun Shong, Sang-Hee Ko Park

Institutions: Korea Advanced Institute of Science and Technology, Hongik University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Ministry of SMEs and Startups

Awards: G6838438222, G7087473087

OpenAlex ID: W4313592562

FWCI: 0.409

Cites: 41

Cited by: 7

Related to: 10