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High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
Work
Year: 2023
Type: article
Abstract: Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to macroscale feature dimensions, is essential for producing functional interfaces for many applications. Arrays ... more
Source: Materials Science in Semiconductor Processing
Authors Zhitian Shi, Konstantins Jefimovs, Marco Stampanoni, Lucia Romano
Institutions Institute for Biomedical Engineering, ETH Zurich, Paul Scherrer Institute
Cites: 70
Cited by: 13
Related to: 10
FWCI: 2.287
Citation percentile (by year/subfield): 100
Topic: Nanowire Synthesis and Applications
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
APC paid (est): $3,030