Work

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Year: 2023

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.22.2.024401

Authors: Tatiana Kovalevich, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4366088708

FWCI: 1.297

Cites:

Cited by: 18

Related to: 10