Work

EUV pellicle scanner integration for N2 nodes and beyond

Year: 2023

Type: conference-abstract

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2658353

Authors: Mark A. van de Kerkhof, Alexander Klein, Beatriz Seoane, Paul Vermeulen, Emily Gallagher, Marina Y. Timmermans, Ivan Pollentier, Joost Bekaert

Institutions: ASML (Netherlands), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4367297027

Cites:

Cited by: 16

Related to: 10