Year: 2023
Type: article
Abstract: High Resolution Image Download MS PowerPoint Slide Blatter radical derivatives are very attractive due to their potential applications, ranging from batteries to quantum technologies. In this work, we focus on the latest insights regarding the fundamental mechanisms of radical thin film (long-term) degradation, by comparing two Blatter radical derivatives. We find that the interaction with different contaminants (such as atomic H, Ar, N, and O and molecular H 2, N 2, O 2, H 2 O, and NH 2 ) affects the chemical and magnetic properties of the thin films upon air exposure. Also, the radical-specific site, where the contaminant interaction takes place, plays a role. Atomic H and NH 2 are detrimental to the magnetic properties of Blatter radicals, while the presence of molecular water influences more specifically the magnetic properties of the diradical thin films, and it is believed to be the major cause of the shorter diradical thin film lifetime in air.
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $5,000
Awards: G2589913962, Gated INTERfaces for FAST information processing, G3562515488, Zusammenspiel von strukturellen und elektronischen Eigenschaften und deren Auswirkungen auf dünne Schichten von metallfreien organischen Radikalen (Fortsetzungsantrag)., Nitrogen Centered Radicals, G434337789, G5463381820, G5567493465, Nitrogen Centered Radicals
OpenAlex ID: W4380853338