Year: 2023
Type: article
Abstract: Doping asymmetry is a notable phenomenon with semiconductors and a particularly long-standing challenge limiting the applications of most wide band-gap semiconductors, which are inherent of spontaneous heavy $n$- or $p$-type doping because of their extreme band edges. This study theoretically shows that by applying a proper external voltage on materials during their growth or doping processes, we can largely tune the band edges and consequently reverse the doping asymmetry in semiconductor thin films. We take zinc oxide as a touchstone and computationally demonstrate that this voltage-assisted doping approach efficiently suppresses the spontaneous $n$-type defects by around four orders under three distinct growth conditions and successfully generates $p$-type zinc oxide up to the lowest acceptor levels. The proposed approach is insensitive to materials, growth conditions, or defects origins, and thus offers a general solution to the doping asymmetry in semiconductor thin films.
Authors: Kai Liu, Zhibin Yi, Guangfu Luo
Language: English
Topic: ZnO doping and properties
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
Awards: G1210117574, G2124539424, G3797420940
OpenAlex ID: W4384204596
