Work

Improvement of Plasma Etching Endpoint Detection With Data-Driven Wavelength Selection and Gaussian Mixture Model

Year: 2023

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2023.3295356

Authors: Chae Sun Kim, Hye Ji Lee, Hae Rang Roh, Taekyoon Park, Yongseok Lee, Jewoo Han, Sungun Kwon, Chanmin Lee, Jongwoo Sun, Kukhan Yoon, Jong Min Lee

Institutions: Seoul National University, Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Science, ICT and Future Planning, Korea Institute for Advancement of Technology, Samsung

Awards: G5183474821, G6207752039

OpenAlex ID: W4384284052

FWCI: 0.855

Cites: 21

Cited by: 12

Related to: 10