EUV debris mitigation using magnetic nulls
Work
Year: 2023
Type: article
Abstract: Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigati... more
Source: Applied Physics Letters
Cites: 25
Cited by: 3
Related to: 10
FWCI: 0.63
Citation percentile (by year/subfield): 67.65
Subfield: Nuclear and High Energy Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: green
Funder U.S. Department of Energy
Grant ID DE-AC02- 09CH11466