Catalytic nickel silicide as an alternative to noble metals in metal-assisted chemical etching of silicon
Year: 2023
Type: article
Source: Nanoscale
DOI: 10.1039/d3nr02053c
Authors: Kyunghwan Kim, Sunhae Choi, Haekyun Bong, Hanglim Lee, Minyoung Kim, Jungwoo Oh
Institution: Yonsei University
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Award: G705742113
OpenAlex ID: W4385432774