Work

Interfacial Stress Induced Enhancement of Ferroelectricity in Al Doped Hfo2 Thin Films

Year: 2023

Type: preprint

Source: SSRN Electronic Journal

DOI: 10.2139/ssrn.4528240

Authors: Sixue Chen, Pengyu Chen, Yusu Wang, Mingming Chen, Xiuxiu Dong, Dawei Cao

Institution: Jiangsu University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W4385452830

Cites: 40

Cited by: 1

Related to: 10