Work

High-NA EUV platform realization as next step in EUV technology

Year: 2023

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.2687756

Authors: Jara . Garcia-Santaclara, Rudy Peeters, Jeroen van Dongen, Rob van Ballegoij, Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, Joerg Mallmann, Greet Stoorms, Peter Vanoppen

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4388911973

FWCI: 2.392

Cites:

Cited by: 5

Related to: 10