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Special Section Guest Editorial: Direct Write Lithography

Year: 2023

Type: article

Abstract: Guest editors Stephen Renwick and Laurent Pain introduce the Special Section on Direct Write Lithography.

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.22.4.041401

Authors: Stephen P. Renwick, Laurent Pain

Institutions: Nikon (United States), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4389272261

FWCI:

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