Work

A Curvilinear OPC Workflow for Highly Repetitive Structures and High Aspect Ratio Patterns

Year: 2023

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1109/iwaps60466.2023.10366061

Authors: Xing Gao, Ken Chen, Xiaomeng Li, Xuan Zhao, Keeho Kim, Xima Zhang, Cynthia Zhu

Institution: Advanced Materials Enterprises (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4390485923

FWCI: 0.488

Cites: 5

Cited by: 1

Related to: 10