Work

Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature

Year: 2024

Type: article

Source: Nanotechnology

DOI: 10.1088/1361-6528/ad27ae

Authors: Jehwan Park, Woong Choi, Jihyun Kim

Institution: Seoul National University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Korea Institute for Advancement of Technology, Samsung

Awards: G2572957395, G5442972664, G7383885958

OpenAlex ID: W4391636504

FWCI: 0.286

Cites: 28

Cited by: 3

Related to: 10