Work

Exposure Tool Development Toward Advanced EUV Lithography: A Journey of 40 Years Driving Moore’s Law

Year: 2024

Type: article

Source: IEEE Electron Devices Magazine

DOI: 10.1109/med.2023.3337129

Author: Jan van Schoot

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4393238510

FWCI: 2.644

Cites: 24

Cited by: 26

Related to: 10