Work

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0003440

Authors: Corbin Feit, Udit Kumar, Md. Rafiqul Islam, Luis Tomar, S. Novia Berriel, John T. Gaskins, Patrick E. Hopkins, Sudipta Seal, Parag Banerjee

Institutions: University of Central Florida, University of Virginia

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Semiconductor Research Corporation, Intel Corporation

Awards: Enhanced conductance at interfaces by ballistic thermal injection, G2635377806, G4924688824, PREM Center for Ultrafast Dynamics and Catalysis in Emerging Materials (C-UDCEM), MRI: Acquisition of State of the Art Imaging X-Ray Photoelectron Spectroscopy: Integrating Nanotechnology, Catalysis, Physics, Manufacturing and Archaeological Research & Education, Plasmoresistor device for optoelectronic transduction

OpenAlex ID: W4393855304

FWCI: 0.313

Cites: 31

Cited by: 4

Related to: 10