Work

Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography

Year: 2024

Type: article

Source: Nanoscale

DOI: 10.1039/d4nr00844h

Authors: Zi-Hao Yang, Jing Zhao, Ya-Juan Cai, Xu Yang, Chuan-Zhe Zhao, Yang Liu, Yi-Bo Li, Ke-Xiao Sang, Yi-Xing Sun, Ya-Ge Wu, Nan-Jun Wei, Jing-Gang Gai

Institutions: Sichuan University, State Key Laboratory of Polymer Materials Engineering

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, State Key Laboratory of Polymer Materials Engineering

Awards: 超高分子量聚乙烯加工改性的耗散粒子动力学理论及平均场理论研究, G2935281146, 超快水传输石墨烯正渗透膜的分离机制研究

OpenAlex ID: W4399432429

FWCI: 0.455

Cites: 31

Cited by: 4

Related to: 10