Investigation of Electronic and Optical Properties of Thin Films of Copper Oxides Deposited by Low-Pressure Arc Discharge
Year: 2024
Type: article
Authors: L. Yu. Fedorov, A. V. Ushakov, I. V. Karpov
Institutions: Russian Academy of Sciences, Krasnoyarsk Scientific Center
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401429464