Work

Improving the Optical Properties of SiN x :H Thin Film by Optimizing NH 3 :SiH 4 Gas Ratio Using Plasma‐Enhanced Chemical Vapor Deposition

Year: 2024

Type: article

Source: Energy Technology

DOI: 10.1002/ente.202401037

Authors: Alamgeer, Hasnain Yousuf, Muhammad Quddamah Khokhar, Jaljalalul Abedin Jony, Rafi ur Rahman, Syed Azkar‐ul Hassan, Youngkuk Kim, Duy Phong Pham, Sangheon Park, Junsin Yi

Institution: Sungkyunkwan University

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Korea Evaluation Institute of Industrial Technology

Award: G2493430203

OpenAlex ID: W4401451990

FWCI: 0.61

Cites: 27

Cited by: 4

Related to: 10