Work

Reactant-Dependent, 108× Conductivity Modulation in Plasma-Enhanced Atomic Layer Deposition for Black TiO2 Films

Year: 2024

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.4c00667

Authors: S. Novia Berriel, Terrick McNealy-James, Taylor M. Currie, Eric Bissell, Brian Butkus, Chien-Hsuan Chen, Luis Tomar, Jacob Baillie, Daniel R. Gamelin, Kristopher O. Davis, Titel Jurca, Parag Banerjee

Institutions: University of Central Florida, University of Washington

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Semiconductor Research Corporation, Division of Materials Research, Division of Electrical, Communications and Cyber Systems

Awards: G4537658108, G4924688824, G7403388210

OpenAlex ID: W4401511148

FWCI: 0.208

Cites: 59

Cited by: 2

Related to: 10