Work

Influence of Initial Film Properties in UVO-Mediated Patterning of an Elastomeric Film Using a TEM Grid

Year: 2024

Type: article

Source: Langmuir

DOI: 10.1021/acs.langmuir.4c00509

Authors: Sushree Ritu Ritanjali, Nandini Bhandaru, Rabibrata Mukherjee

Institutions: Indian Institute of Technology Kharagpur, Birla Institute of Technology and Science - Hyderabad Campus, Birla Institute of Technology and Science, Pilani

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401516276

FWCI: 0.526

Cites: 42

Cited by: 5

Related to: 10