Work

A strategy to fabricate nanostructures with sub-nanometer line edge roughness

Year: 2024

Type: article

Source: Nanotechnology

DOI: 10.1088/1361-6528/ad6e88

Authors: Xin Zhuang, Yunsheng Deng, Yue Zhang, Kaimin Wang, Yulong Chen, Shiyang Gao, Jingfu Xu, Liqiu Wang, Xing Cheng

Institutions: Southern University of Science and Technology, University of Hong Kong, Tencent (China), Shenzhen Technology University, Hong Kong Polytechnic University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Science, Technology and Innovation Commission of Shenzhen Municipality, Shenzhen Municipal Science and Technology Innovation Council, Special Project for Research and Development in Key areas of Guangdong Province

Awards: G4517909267, G4823623664, G5244427266, G8901964519

OpenAlex ID: W4401528852

FWCI: 0.411

Cites: 54

Cited by: 4

Related to: 10