Low-temperature growth of high-quality VO2 epitaxial film on c-plane sapphire by reactive magnetron sputtering
Year: 2024
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0219061
Authors: Chang Liu, Zhi Zheng, Xing Li, Yang Wang, Xiang Dong, Gaoshan Huang, Yongfeng Mei
Institution: Fudan University
Language: English
Subfield: Polymers and Plastics
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G5452858756, G5618270584, G7466754588
OpenAlex ID: W4401543739
