Suppression of Threshold Voltage Variation by H₂ Plasma Improved KrF Photoresist Profile
Year: 2024
Type: article
Authors: Cheng-Hao Liang, Ran Bi, Hao Liu, Song He, Hang Li, Yu-Long Jiang
Institutions: Fudan University, State Key Laboratory of ASIC and System
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G6194195854
OpenAlex ID: W4401634308